etch depth造句
例句與造句
- The reciprocal space map of x - ray difll - action for quantum - wires is simulated successfully . abundant structural intbrmation such as array period , geometric shape , etching depth and strain state , etc . for quantum wires are obtained
模擬了量于線x射線衍射的二三維圖,得到更為豐富的樣品結(jié)構(gòu)信息,例如周期,形狀,刻蝕深度,應(yīng)變等。 - Through the analysis , it is shown that : 1 , while fabricating the grating , the principle of selecting the parameters is : the period should be as large as possible , the etching depth should be small and filling factor should approach to 0 . 25 . 2 , if selecting the parameter combine the selecting principle and the requirement of concrete application , the space of selecting the parameter should be larger than before . 3 , while the period to . 4a , , the surface profile has no effect on the reflectivity
通過(guò)分析發(fā)現(xiàn): 1 、在制作有一定特性的光柵時(shí),光柵參數(shù)的選擇原則為:周期的取值應(yīng)盡量的大,刻蝕深度的取值應(yīng)盡量的小,占空比的取值應(yīng)盡量靠近f = 0 . 25 ; 2 、以參數(shù)的選擇原則結(jié)合制作的具體應(yīng)用要求宋選擇光柵的參數(shù),則各個(gè)參數(shù)的優(yōu)化空間更大; 3 、當(dāng)光柵的周期t 0 . 4時(shí),表面面形對(duì)反射率沒有影響; 4 、運(yùn)用臨界周期點(diǎn)隨折射率的變化規(guī)律,可以避免由于選擇光柵周期過(guò)大而出現(xiàn)一級(jí)衍射,從而導(dǎo)致制作失敗。 - It's difficult to find etch depth in a sentence. 用etch depth造句挺難的